• Skip to Content
  • Skip to Main Navigation
  • Skip to Search

Indiana University Indiana University IU

Open Search
  • Search Resources
  • Add Resources
  • Research Impact
  • Contact Us

Research Equipment and Tools

  • Home
  • Search Resources
  • Add Resources
  • Research Impact
  • Contact Us
  • Search

UV Exposure System and Mask Aligner

Model: OAI Model 200

Facility: Nanoscale Characterization Facility

Function: The OAI model 200 is a mask aligner and UV exposure systems. Utilizing an air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photomask alignment and uniform contact across the substrate during contact exposure. The system is equipped with a single field Meji microscope and is capable of one micron resolution and alignment precision. The alignment module features a mask insert for a 5 x 5″ mask and a substrate chuck for 4″ square substrates. Up to 6″ diameter substrates can be accommodated with optional tooling. The system can operate in soft contact, hard contact, or vacuum contact modes and the force between the substrate and mask can be adjusted with a user-settable electronic ‘clutch’ system. The system provides collimated UV light in near UV using a 500W lamp.

Find

  • Contact Information
  • Centers & Institutes

Tools

  • Ilab
  • Pivot

Websites

  • Research @ IU
  • Research Technologies @ IU

Indiana University

Accessibility | College Scorecard | Privacy Notice | Copyright © 2025 The Trustees of Indiana University