PLASMA ETCH INC PE50XL Benchtop Plasma Cleaning System
Model: PLASMA ETCH INC PE50XL
Description: It is a compact, high-performance unit designed for surface preparation and cleaning. It uses low-pressure plasma technology to remove organic contaminants, improve adhesion, and activate surfaces, making it ideal for semiconductor, medical device, and research applications requiring precision and reliability.
Function: It functions to clean and activate surfaces using low-pressure plasma technology. It removes organic contaminants, enhances adhesion, and modifies surface properties without harsh chemicals, making it ideal for precision cleaning in semiconductor, medical device, and research applications requiring high reliability.
Features: It includes compact benchtop design, low-pressure plasma technology for precise cleaning, adjustable process parameters, fast cycle times, environmentally friendly operation without harsh chemicals, uniform surface activation, and compatibility with various substrates, ensuring reliable performance for semiconductor and research applications. It includes:
- Durable Welded Aluminium Vacuum Chamber
- Chamber Dimensions: 200x225x100mm (8″x9″x4″)
- Single 175x200mm RF Powered Electrode
- 400W, 50KHz Continuously Variable Power Supply
- 2 Rotometer Gas Control 0-25cc/min
- Pirani Vacuum Gauge, 0-1Torr
- PLC Microprocessor Control System
- Keypad user interface with alphanumeric display
- Storage of one Process Recipe
- Automatic Process Sequencing
- 5 CFM Oxygen Service Vacuum Pump
- Pump footprint 175x400mm (7” x 16”)
- Console Dimensions: 350x350x450mm (14x14x18″)
- Approximate Shipping weight is 45Kg
- Electrical: 230/240VAC, 14A"
Contact:
- Unit: Integrated Nanosystems Development Institute
- Campus: Indianapolis
- Resource Type: Equipment
- Contact Name: Dipak Maity
- Contact Email: maityd@iu.edu
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