OAI 200 Mask Aligner UV Exposure and Lithography System
Model: OAI 200
Description: UV photolithography system for transferring patterns from photomasks onto photoresist-coated substrates with high alignment accuracy.
Function: Photomask alignment; UV exposure of photoresist; micro- and nanofabrication patterning.
Features: Contact, soft-contact, and proximity exposure modes; uniform UV illumination; precision X/Y/θ alignment stages; vacuum substrate chuck; reproducible exposure control.
Contact:
- Unit: Integrated Nanosystems Development Institute
- Campus: Indianapolis
- Resource Type: Equipment
- Contact Name: Dipak Maity
- Contact Email: maityd@iu.edu
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