Laurell Technologies Spin Coaters (x2)- Photoresist Application & Development Spinners
Description: Programmable spin coating systems for uniform application of photoresists and thin films on flat substrates.
Function: Photoresist coating; polymer thin-film deposition; resist development and rinsing.
Features: Precise control of spin speed, acceleration, and time; vacuum chuck substrate hold; recipe storage; dynamic braking; high coating uniformity and repeatability.
Contact:
- Unit: Integrated Nanosystems Development Institute
- Campus: Indianapolis
- Resource Type: Equipment
- Contact Name: Dipak Maity
- Contact Email: maityd@iu.edu
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